High-performance Recessed-channel Reconfigurable Field-effect Transistor using Si-Ge Heterojunction
A novel strategy is introduced, herein, for the better current drivability ($I_{ON}$) of recessed-channel reconfigurable field-effect transistor (RC-RFET) maintaining low-level off-state leakage current ($I_{OFF}$). A proposed Si-Ge heterojunction RC-RFET features ultra-thin Ge layer selectively gro...
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Published in | Journal of semiconductor technology and science Vol. 18; no. 3; pp. 392 - 395 |
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Main Authors | , |
Format | Journal Article |
Language | English Korean |
Published |
대한전자공학회
01.06.2018
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Subjects | |
Online Access | Get full text |
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Summary: | A novel strategy is introduced, herein, for the better current drivability ($I_{ON}$) of recessed-channel reconfigurable field-effect transistor (RC-RFET) maintaining low-level off-state leakage current ($I_{OFF}$). A proposed Si-Ge heterojunction RC-RFET features ultra-thin Ge layer selectively grown on source/drain contacts. Thus, Schottky barrier height is reduced while Shockley-Read-Hall recombination and band-to-band tunneling leakages are efficiently suppressed. The optimized Si-Ge heterojunction RC-RFET shows ${\times}25$ and ${\times}102$ better $I_{ON}/I_{OFF}$ for n- and p-FETs than that of Si homo-junction ones, respectively. |
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ISSN: | 1598-1657 2233-4866 |
DOI: | 10.5573/JSTS.2018.18.3.392 |