Effect of Excitation Frequency on the Spatial Distributions of a Surface Wave Plasma
Using different frequencies of 2.45 GHz and 915 MHz, the effect of excitation frequency on the spatial distributions of a surface wave plasma for 450 mm wafer processing was experimentally investigated at a medium pressure of 1 Torr. As a result, it was found that the mode number of standing waves w...
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| Published in | Japanese Journal of Applied Physics Vol. 50; no. 1; pp. 01AB07 - 01AB07-4 |
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| Main Authors | , , , , , , |
| Format | Journal Article |
| Language | English |
| Published |
The Japan Society of Applied Physics
01.01.2011
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| Online Access | Get full text |
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| Summary: | Using different frequencies of 2.45 GHz and 915 MHz, the effect of excitation frequency on the spatial distributions of a surface wave plasma for 450 mm wafer processing was experimentally investigated at a medium pressure of 1 Torr. As a result, it was found that the mode number of standing waves which the surface waves form in the radial direction has great influence on the radial distribution of plasma density. Consequently, the plasma uniformity in the downstream region at 915 MHz was better than that at 2.45 GHz. On the other hand, the electron temperature was roughly constant and below 1.5 eV except in the vicinity of the quartz window at both frequencies. |
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| Bibliography: | Schematic diagram (top view) of the experimental setup. Spatial distributions of electron temperature: (a) 2.45 GHz; (b) 915 MHz. Spatial distributions of electron density: (a) 2.45 GHz; (b) 915 MHz. Uniformity of plasma density in the downstream region ($z = 200$ mm). Spatial distributions of microwaves: (a) 2.45 GHz; (b) 915 MHz. Axial distributions of electron density on the central axis: (a) 2.45 GHz; (b) 915 MHz. Axial distributions of microwaves on the central axis: (a) 2.45 GHz; (b) 915 MHz. |
| ISSN: | 0021-4922 1347-4065 |
| DOI: | 10.1143/JJAP.50.01AB07 |