Optical Properties of Siloxene Films Prepared by High-Temperature Heat Treatment from Thin Films of Polysilane Containing Anthryl Groups

We report the synthesis of linear and network polysilanes containing anthryl groups and the optical properties of the thin films by heat treatments. We observe the shift to a lower energy of the absorption edge in UV--visible absorption spectra of the thin films, when the polysilane films were heate...

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Published inJapanese Journal of Applied Physics Vol. 50; no. 4; pp. 04DK18 - 04DK18-5
Main Authors Tachibana, Hiroaki, Mizuno, Toya, Ishibe, Satoko
Format Journal Article
LanguageEnglish
Published The Japan Society of Applied Physics 01.04.2011
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Summary:We report the synthesis of linear and network polysilanes containing anthryl groups and the optical properties of the thin films by heat treatments. We observe the shift to a lower energy of the absorption edge in UV--visible absorption spectra of the thin films, when the polysilane films were heated at 500 °C. This behavior is interpreted in terms of the formation of network siloxene films by the dissociation of anthryl groups from silicon structures and the accompanying incorporation of oxygen into the silicon structures. The addition of UV irradiation before heating enhances the spectral changes caused by heat treatment. It is shown that a vacuum degree during heating and backbone structures of polysilanes affect the formation of the network siloxene structures by heat treatment.
Bibliography:Chemical structures of PABS and PAS. UV--visible absorption spectra of PABS thin films after heat treatment at a given temperature for 10 min under a reduced pressure of $7\times 10^{3}$ Pa. Infrared reflection--absorption (RA) spectra of PABS thin films after heat treatment at given temperatures for 10 min under a reduced pressure of $7\times 10^{3}$ Pa. AFM images of a PABS thin film. The scanned areas are $20\times 20$ μm 2 : (a) before heating and (b) after heating at 500 °C for 10 min under a reduced pressure of $7\times 10^{3}$ Pa. UV--visible absorption spectra of PABS thin films after heat treatment at 500 °C for 10 min under a given vacuum degree. Change of absorption spectra of a PABS thin film on irradiation with UV light. UV--visible absorption spectra of PABS thin films before UV irradiation, after irradiation for 30 min, and after heat treatment at 500 °C for 10 min under a reduced pressure of $7\times 10^{3}$ Pa. UV--visible absorption spectra of PABS thin films after heat treatment at 500 °C for 10 min under a given vacuum degree. UV--visible absorption spectra of PAS thin films after heat treatment at 500 °C for 1 h under a reduced pressure of $7\times 10^{3}$ Pa: (a) without UV irradiation and (b) after irradiation for 30 min. UV--visible absorption spectra of PAS thin films after heat treatment at 500 °C for 1 h under a given vacuum degree: (a) without UV irradiation and (b) after irradiation for 30 min.
ISSN:0021-4922
1347-4065
DOI:10.1143/JJAP.50.04DK18