Dual mode of deep oscillation magnetron sputtering

• Published in: Surface & coatings technology Vol. 387; pp. 125559 - 9
• Main Authors: Oskirko, V.O., Zakharov, A.N., Pavlov, A.P., Solovyev, A.A., Grenadyorov, A.S., Semenov, V.A.
• Format: Journal Article
• Language: English
• Published: Lausanne Elsevier B.V 15.04.2020; Elsevier BV
• Subjects: Al2O3 coating; Aluminum; Aluminum oxide; Arc deposition; Current voltage characteristics; Deep oscillation magnetron sputtering; Dual magnetron sputtering; Electron bombardment; Electron energy; Hardness; Ion bombardment; Ion current density; Ion currents; Langmuir waves; Magnetron sputtering; Oxide coatings; Parameters; Plasma parameters; Reactive sputtering; Substrates; TiO2 coating; Titanium dioxide; Titanium oxides; Waveforms; Deep oscillation magnetron sputtering; Reactive sputtering; Plasma parameters; Dual magnetron sputtering; Al2O3 coating; TiO2 coating
• ISSN: 0257-8972; 1879-3347
• DOI: 10.1016/j.surfcoat.2020.125559

The paper presents the results of an experimental investigation on the dual-target mode of deep oscillation magnetron sputtering (DOMS). To power the dual DOMS discharge, high-power bipolar micropulse packets were used, which form a 1–3-ms-duration macropulses. The current-voltage characteristic of discharge was measured in the dual DOMS mode, and the pulse waveform of the ion current on the substrate was analyzed. It is shown that during a macropulse, the substrate is exposed to a continuous ion bombardment. Plasma parameters, such as electron temperature, electron concentration, and ion current density were measured and compared using a triple Langmuir probe in three sputtering modes (DC, dual mid-frequency and dual DOMS). Moreover, the ion-to-atom arrival ratio on the substrate was evaluated for the indicated modes of sputtering aluminum targets. The dual DOMS capabilities were demonstrated by Al2O3 and TiO2 dielectric coating deposition in the reactive sputtering mode. The possibility was shown for arc-free coating deposition with the sputtering mode stabilization via control for parameters of electrical discharges. Aluminum oxides obtained at a low (300 °C) substrate temperature, include θ-phase, possess rather high hardness (15 GPa) and large transmission in the visible range. Titanium oxide coatings are characterized by 11 GPa hardness, 3.1–3.5 eV band gap width and consist mostly of the rutile phase. •Dual-target system was used in deep oscillation magnetron sputtering (DOMS) mode.•Dual DOMS method was compared with DC and mid-frequency dual magnetron sputtering.•Discharge characteristics in dual DOMS mode were investigated.•Al2O3 and TiO2 coatings were deposited to show the advantages of dual DOMS method.