In-situ Low Energy Argon Ion Milling of Nanoelectronic Structures Using a Triple Beam System

Extended abstract of a paper presented at Microscopy and Microanalysis 2009 in Richmond, Virginia, USA, July 26 – July 30, 2009

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Published inMicroscopy and microanalysis Vol. 15; no. S2; pp. 170 - 171
Main Authors Stegmann, H, Ritz, Y, Utess, D, Engelmann, H-J, Zschech, E
Format Journal Article
LanguageEnglish
Published New York, USA Cambridge University Press 01.07.2009
Oxford University Press
Subjects
Exhibitor Symposium: Making the Nano-Future Real: Instruments and Techniques that are Impacting Todays Research for Tomorrows Breakthroughs
Instrumentation and Techniques
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Summary:Extended abstract of a paper presented at Microscopy and Microanalysis 2009 in Richmond, Virginia, USA, July 26 – July 30, 2009
ISSN:1431-9276
1435-8115
DOI:10.1017/S1431927609094021