Etching properties of Al2O3 films in inductively coupled plasma
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Published in | Thin solid films Vol. 459; no. 1-2; pp. 122 - 126 |
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Main Authors | , , |
Format | Conference Proceeding Journal Article |
Language | English |
Published |
Lausanne
Elsevier Science
01.07.2004
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Subjects | |
Online Access | Get full text |
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ISSN: | 0040-6090 1879-2731 |
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DOI: | 10.1016/j.tsf.2003.12.113 |