Angle-resolved X-ray photoemission electron microscopy

• Published in: Journal of electron spectroscopy and related phenomena Vol. 185; no. 10; pp. 323 - 329
• Main Authors: Menteş, Tevfik Onur, Locatelli, Andrea
• Format: Journal Article
• Language: English
• Published: Elsevier B.V 01.10.2012
• Subjects: ARPES; Darkfield; Diffraction; Electron microscopy; Electronic structure; Imaging; LEEM; Microprobe; Oxides; Photoemission; Synchrotrons; XPEEM; Microprobe; XPEEM; LEEM; ARPES; Darkfield
• ISSN: 0368-2048; 1873-2526
• DOI: 10.1016/j.elspec.2012.07.007

► Microprobe ARPES is successfully applied to studies on graphene. ► We propose a novel approach by applying dark field methods to XPEEM. ► The lateral resolution in dark field XPEEM is better than 40nm. ► Dark field XPEEM is applied to O/W(110) to determine adsorption site symmetry. Synchrotron based photoemission electron microscopy with energy filter combines real space imaging with microprobe diffraction (μ-ARPES), giving access to the local electronic structure of laterally inhomogeneous materials. We present here an overview of the capabilities of this technique, illustrating selected applications of angle resolved photoemission electron microscopy and related microprobe methods. In addition, we report the demonstration of a darkfield XPEEM (df-XPEEM) imaging method for real space mapping of the electronic structure away from Γ at a lateral resolution of few tens of nm. The application of df-XPEEM to the (1×12)-O/W(110) model oxide structure shows the high sensitivity of this technique to the local electronic structure, allowing to image domains with inequivalent adsorption site symmetry. Perspectives of angle-resolved PEEM are discussed.