Analysis of the Surface Microtexture of Sputtered Indium Tin Oxide Thin Films

The present research work involves the study of the 3-D surface microtexture of sputtered indium tin oxide (ITO) prepared on glass substrates by DC magnetron at room temperature. The samples were annealed at 450°C in air and were distributed into five groups, dependent on ambient combinations applie...

Full description

Saved in:
Bibliographic Details
Published inArchives of metallurgy and materials Vol. 66; no. 2; pp. 443 - 450
Main Authors Ţălu, Ş, Kulesza, S, Bramowicz, M, Stępień, K, Dastan, D
Format Journal Article
LanguageEnglish
Published Warsaw Polish Academy of Sciences 01.01.2021
Subjects
3-d surface microtexture
afm
Argon
Atomic force microscopy
dc magnetron sputtering
Glass substrates
Indium tin oxides
ito thin films
Microtexture
Oxygen
Parameters
Room temperature
Statistical methods
stereometric analysis
Thin films
Online AccessGet full text

Cover

More Information
Summary:The present research work involves the study of the 3-D surface microtexture of sputtered indium tin oxide (ITO) prepared on glass substrates by DC magnetron at room temperature. The samples were annealed at 450°C in air and were distributed into five groups, dependent on ambient combinations applied, as follows: I group, using argon (Ar); II group, using argon with oxygen (Ar+O2); III group, using argon with oxygen and nitrogen (Ar+O2+N2); IV group, using argon with oxygen and hydrogen (Ar+O2+H2); and V group, using argon with oxygen, nitrogen, and hydrogen (Ar+O2+N2+H2). The characterization of the ITO thin film surface microtexture was carried out by atomic force microscopy (AFM). The AFM images were stereometrically quantitatively analyzed to obtain statistical parameters, by ISO 25178-2: 2012 and ASME B46.1-2009. The results have shown that the 3-D surface microtexture parameters change in accordance with different fabrication ambient combinations.
ISSN:1733-3490
2300-1909
DOI:10.24425/amm.2021.135877