Investigation of Low-Frequency Noise Characteristics of Ferroelectric Tunnel Junction: From Conduction Mechanism and Scaling Perspectives

We investigate the effects of length (<inline-formula> <tex-math notation="LaTeX">{L} </tex-math></inline-formula>) and width (<inline-formula> <tex-math notation="LaTeX">{W} </tex-math></inline-formula>) scaling on the low-frequenc...

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Bibliographic Details
Published inIEEE electron device letters Vol. 43; no. 6; pp. 958 - 961
Main Authors Shin, Wonjun, Bae, Jong-Ho, Kwon, Dongseok, Koo, Ryun-Han, Park, Byung-Gook, Kwon, Daewoong, Lee, Jong-Ho
Format Journal Article
LanguageEnglish
Published New York IEEE 01.06.2022
The Institute of Electrical and Electronics Engineers, Inc. (IEEE)
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Summary:We investigate the effects of length (<inline-formula> <tex-math notation="LaTeX">{L} </tex-math></inline-formula>) and width (<inline-formula> <tex-math notation="LaTeX">{W} </tex-math></inline-formula>) scaling on the low-frequency noise characteristics of the ferroelectric tunnel junction (FTJ). The FTJ is composed of metal/ferroelectric/dielectric/semicondu- ctor (TiN/HfZrO 2 /SiO 2 /<inline-formula> <tex-math notation="LaTeX">{n}^{+} </tex-math></inline-formula> Si). In the high-resistance state, 1/<inline-formula> <tex-math notation="LaTeX">{f} </tex-math></inline-formula> noise increases proportionally to 1/<inline-formula> <tex-math notation="LaTeX">{W}^{\alpha }{L}^{\beta } </tex-math></inline-formula> (<inline-formula> <tex-math notation="LaTeX">\alpha \cong ~1 </tex-math></inline-formula>, <inline-formula> <tex-math notation="LaTeX">\beta >1 </tex-math></inline-formula>), whereas the shot noise has no scaling dependence. In the low-resistance state, the 1/<inline-formula> <tex-math notation="LaTeX">{f} </tex-math></inline-formula> noise of the FTJ shows a more sensitive dependence on <inline-formula> <tex-math notation="LaTeX">{L} </tex-math></inline-formula> scaling than <inline-formula> <tex-math notation="LaTeX">{W} </tex-math></inline-formula> scaling since the switching and conduction mechanisms are more affected by the process-induced damaged edge regions.
ISSN:0741-3106
1558-0563
DOI:10.1109/LED.2022.3168797