Yttria-stabilized zirconia thin film electrolyte produced by RF sputtering for solid oxide fuel cell applications

Thin film (40–600 nm) yttria-stabilized zirconia (YSZ) electrolytes for solid oxide fuel cells (SOFC) were deposited on NiO-YSZ anodes and fused silica substrates by RF sputtering, using low applied power without the use of post deposition annealing heat treatment. YSZ film showed a nanocrystalline...

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Published inMaterials letters Vol. 64; no. 22; pp. 2450 - 2453
Main Authors Smeacetto, Federico, Salvo, Milena, Ajitdoss, Lakshmi Chandru, Perero, Sergio, Moskalewicz, Tomasz, Boldrini, Stefano, Doubova, Lioudmila, Ferraris, Monica
Format Journal Article
LanguageEnglish
Published Elsevier B.V 30.11.2010
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Summary:Thin film (40–600 nm) yttria-stabilized zirconia (YSZ) electrolytes for solid oxide fuel cells (SOFC) were deposited on NiO-YSZ anodes and fused silica substrates by RF sputtering, using low applied power without the use of post deposition annealing heat treatment. YSZ film showed a nanocrystalline structure and consisted of the Zr .85Y .15O 1.93 (fcc) phase. The film was dense and the YSZ/anode interface was continuous and crack free. According to preliminary in-plane conductivity measurements (temperature range 550–750 °C) on the YSZ film, the activation energy for ionic conduction was found to be 1.18 ± 0.01 eV.
Bibliography:ObjectType-Article-2
SourceType-Scholarly Journals-1
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content type line 23
ISSN:0167-577X
1873-4979
DOI:10.1016/j.matlet.2010.08.016