Determination of hydrogen absorption in Pd coated Al thin films
Al films, 80–85 nm in thickness and 10–30 μΩ cm in resistivity, are coated with Pd (8–40 nm). The bilayer is exposed to a hydrogen atmosphere of up to 4.0 kPa. The hydrogen concentration is calculated from the frequency change in a quartz crystal microbalance and the electrical resistance of the Pd...
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Published in | Thin solid films Vol. 300; no. 1; pp. 295 - 298 |
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Main Authors | , , , |
Format | Journal Article |
Language | English |
Published |
Elsevier B.V
28.05.1997
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Subjects | |
Online Access | Get full text |
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Summary: | Al films, 80–85 nm in thickness and 10–30 μΩ cm in resistivity, are coated with Pd (8–40 nm). The bilayer is exposed to a hydrogen atmosphere of up to 4.0 kPa. The hydrogen concentration is calculated from the frequency change in a quartz crystal microbalance and the electrical resistance of the Pd film, the Al film and the bilayer is measured as function of hydrogen pressure. Concentration and resistance measurements indicate that the Pd coating enables the Al films to absorb hydrogen from the gas phase. |
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Bibliography: | ObjectType-Article-2 SourceType-Scholarly Journals-1 ObjectType-Feature-1 content type line 23 |
ISSN: | 0040-6090 1879-2731 |
DOI: | 10.1016/S0040-6090(96)09493-X |