Determination of hydrogen absorption in Pd coated Al thin films

Al films, 80–85 nm in thickness and 10–30 μΩ cm in resistivity, are coated with Pd (8–40 nm). The bilayer is exposed to a hydrogen atmosphere of up to 4.0 kPa. The hydrogen concentration is calculated from the frequency change in a quartz crystal microbalance and the electrical resistance of the Pd...

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Bibliographic Details
Published inThin solid films Vol. 300; no. 1; pp. 295 - 298
Main Authors Azofeifa, D.E., Clark, N., Amador, A., Sáenz, A.
Format Journal Article
LanguageEnglish
Published Elsevier B.V 28.05.1997
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Summary:Al films, 80–85 nm in thickness and 10–30 μΩ cm in resistivity, are coated with Pd (8–40 nm). The bilayer is exposed to a hydrogen atmosphere of up to 4.0 kPa. The hydrogen concentration is calculated from the frequency change in a quartz crystal microbalance and the electrical resistance of the Pd film, the Al film and the bilayer is measured as function of hydrogen pressure. Concentration and resistance measurements indicate that the Pd coating enables the Al films to absorb hydrogen from the gas phase.
Bibliography:ObjectType-Article-2
SourceType-Scholarly Journals-1
ObjectType-Feature-1
content type line 23
ISSN:0040-6090
1879-2731
DOI:10.1016/S0040-6090(96)09493-X