Development of ion imprinted based magnetic nanoparticles for selective removal of arsenic (III) and arsenic (V) from wastewater

In this study, we fabricated magnetic ion-imprinted polymers (IIP) for arsenic removal. Ion-imprinted method was developed by complexing N-methacryloyl-l-cysteine (MAC) monomer and As(III) and As(V) as template molecules. The utilization of the MAC-As complex was chosen to provide a rebinding of As(...

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Published inSeparation science and technology Vol. 57; no. 6; pp. 990 - 999
Main Authors Türkmen, Deniz, Özkaya Türkmen, Melike, Akgönüllü, Semra, Denizli, Adil
Format Journal Article
LanguageEnglish
Published Abingdon Taylor & Francis 13.04.2022
Taylor & Francis Ltd
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Summary:In this study, we fabricated magnetic ion-imprinted polymers (IIP) for arsenic removal. Ion-imprinted method was developed by complexing N-methacryloyl-l-cysteine (MAC) monomer and As(III) and As(V) as template molecules. The utilization of the MAC-As complex was chosen to provide a rebinding of As(III) and As(V) on IIP. The template molecules were removed by using 0.01 M HNO 3 containing 0.05% thiourea solution as a desorption agent. The adsorption of As(III) and As(V) was ideal in buffer solution pH 5.0 for 120 min with removal capacity. The ion-imprinted-based magnetic nanoparticles were selective for arsenic toward other analogs (NO 3 − , PO 4 3- , SO 4 2- as an anion, and AsO 2 − , HAsO 4 − as an oxi-anion). The adsorption isotherm model fitted the Langmuir model with an R 2 value of 0.9935-0.9118 and the Q max values of 91.7 mg/g for As(III)-IIP magnetic nanoparticles and 99.0 mg/g As(V)-IIP nanoparticles, respectively. Finally, IIP-based magnetic nanoparticle adsorbents have been utilized successfully for effective arsenic removal from wastewater samples.
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ISSN:0149-6395
1520-5754
DOI:10.1080/01496395.2021.1956972