Preparation of Silicon-on-Insulator Wafer Using Spin Etching and a Subsequent Selective Etching Process

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Bibliographic Details
Published inJapanese Journal of Applied Physics Vol. 41; no. Part 1, No. 8; pp. 5024 - 5029
Main Authors Lee, Seong-Eun, Oh, Seung-Jin, So, Sang-Mun, Kim, Heon-Do, Chung, Sung-Woong, Sohn, Hyun-Chul
Format Journal Article
LanguageEnglish
Published 2002
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ISSN:0021-4922
1347-4065
DOI:10.1143/JJAP.41.5024