Use of Cr Interlayer to Promote the Adhesion of SiC Films Deposited on Ti-6Al-4V by HiPIMS

In this paper, chrome (Cr) thin films were deposited and used as interlayer between SiC films and Ti-6Al-4V substrates. Films and interlayers were obtained by using HiPIMS (High Power Impulse Magnetron Sputtering) technique. Interlayers were growth for 5, 30, and 60 minutes. The films were analyzed...

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Published inMaterials research (São Carlos, São Paulo, Brazil) Vol. 18; no. 5; pp. 904 - 907
Main Authors Merij, Abrão Chiaranda, Sugahara, Tarcila, Martins, Gislene Valdete, Silva Sobrinho, Argemiro Soares da, Reis, Danieli Aparecida Pereira, Gonçalves, Polyana Alves Radi, Massi, Marcos
Format Journal Article
LanguageEnglish
Portuguese
Published ABM, ABC, ABPol 01.10.2015
Associação Brasileira de Metalurgia e Materiais (ABM); Associação Brasileira de Cerâmica (ABC); Associação Brasileira de Polímeros (ABPol)
Subjects
adhesion
Adhesive strength
Cr interlayer
ENGINEERING, CHEMICAL
HiPIMS
Impulses
Interlayers
MATERIALS SCIENCE, MULTIDISCIPLINARY
METALLURGY & METALLURGICAL ENGINEERING
Roughness
SiC thin film
Silicon carbide
Stoichiometry
Thin films
Titanium base alloys
HiPIMS
adhesion
SiC thin film
Cr interlayer
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Summary:In this paper, chrome (Cr) thin films were deposited and used as interlayer between SiC films and Ti-6Al-4V substrates. Films and interlayers were obtained by using HiPIMS (High Power Impulse Magnetron Sputtering) technique. Interlayers were growth for 5, 30, and 60 minutes. The films were analyzed with respect to morphology, stoichiometry, thickness, roughness, and adhesion. The results showed that the HiPIMS technique was efficient to produce dense thin films and that the adhesion increased with Cr thickness.
Bibliography:ObjectType-Article-1
SourceType-Scholarly Journals-1
ObjectType-Feature-2
content type line 23
ISSN:1516-1439
1980-5373
1516-1439
1980-5373
DOI:10.1590/1516-1439.313114