Carbon nano-particles prepared by ion-clustering in plasma
The plasma-assisted chemical vapour deposition technique was used to produce carbon nano-particles in a dusty plasma condition, at increased gas pressure and decreased electric field. The negatively biased upper electrode levitates the forming carbon clusters, which grow in a spherical symmetrical w...
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Published in | Vacuum Vol. 71; no. 1; pp. 171 - 176 |
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Main Authors | , , , , , , |
Format | Journal Article Conference Proceeding |
Language | English |
Published |
Oxford
Elsevier Ltd
09.05.2003
Elsevier |
Subjects | |
Online Access | Get full text |
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Summary: | The plasma-assisted chemical vapour deposition technique was used to produce carbon nano-particles in a dusty plasma condition, at increased gas pressure and decreased electric field. The negatively biased upper electrode levitates the forming carbon clusters, which grow in a spherical symmetrical way in the relatively large density of the ions of the plasma. The spheres also attach to each other, but their concentration and mobility being low, the aggregation results in a different structure: a necklace-type chain will be formed. The dust particles, leaving the plasma cover the chamber wall, but a substantial amount of them reach the electrically driven substrate; forming an amorphous carbon film. The cluster systems were investigated by transmission electron microscopy, atomic force microscopy, Raman, infrared and photoluminescence spectroscopic methods. |
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ISSN: | 0042-207X 1879-2715 |
DOI: | 10.1016/S0042-207X(02)00733-9 |