Concentration profiles of ion exchanged optical waveguides in glass: analysed in hollow cathode plasma

• Published in: Surface & coatings technology Vol. 166; no. 2; pp. 201 - 205
• Main Authors: Djulgerova, R., Pantchev, B., Mihailov, V., Gencheva, V., Flaga, J.
• Format: Journal Article
• Language: English
• Published: Lausanne Elsevier B.V 24.03.2003; Elsevier
• Subjects: Depth profiling; Exact sciences and technology; Glow discharge sputtering; Hollow cathode discharge; Optical (ultraviolet, visible, infrared) measurements; Optical waveguides; Physics; Physics of gases, plasmas and electric discharges; Physics of plasmas and electric discharges; Plasma diagnostic techniques and instrumentation; Hollow cathode discharge; Depth profiling; Optical waveguides; Glow discharge sputtering; Hollow cathodes; Plasma diagnostics; Electrode discharge; Emission spectroscopy; Refractive index; Ion beam sputtering; Planar waveguides; Ion exchange; Experimental study; Depth profiles; Glow discharges
• ISSN: 0257-8972; 1879-3347
• DOI: 10.1016/S0257-8972(02)00788-0

In this study the possibility of hollow cathode discharge for depth profiling of optical waveguides is demonstrated. Planar optical waveguides fabricated by Ag +–Na + and K +–Na + ion exchange processes in glasses are studied. The depth profiles of ion concentrations in these optical waveguides are determined by layer-by-layer emission spectral analysis in hollow cathode plasma. The results agree with ion concentration profiles obtained by method based on refractive index profiles.