Effect of negative bias on TiAlSiN coating deposited on nitrided Zircaloy-4

TiAlSiN coatings were deposited on the nitrided Zircaloy-4 by multi-arc ion plating at −100 V, −200 V and −300 V. In this study, the high temperature oxidation behavior of coatings was tested by a box-type resistance furnace in air for 3 h at 800 °C; the macro-morphology of coatings was observed and...

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Bibliographic Details
Published inJournal of nuclear materials Vol. 498; pp. 76 - 82
Main Authors Jun, Zhou, Zhendong, Feng, Xiangfang, Fan, Yanhong, Liu, Huanlin, Li
Format Journal Article
LanguageEnglish
Published Amsterdam Elsevier B.V 01.01.2018
Elsevier BV
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Summary:TiAlSiN coatings were deposited on the nitrided Zircaloy-4 by multi-arc ion plating at −100 V, −200 V and −300 V. In this study, the high temperature oxidation behavior of coatings was tested by a box-type resistance furnace in air for 3 h at 800 °C; the macro-morphology of coatings was observed and analyzed by a zoom-stereo microscope; the micro-morphology of coatings was analyzed by a scanning electron microscopy (SEM), and the chemical elements of samples were analyzed by an energy dispersive spectroscopy(EDS); the adhesion strength of the coating to the substrate was measured by an automatic scratch tester; and the phases of coatings were analyzed by an X-ray diffractometer(XRD). Results show that the coating deposited at −100 V shows better high temperature oxidation resistance behavior, at the same time, Al elements contained in the coating is of the highest amount, meanwhile, the adhesion strength of the coating to the substrate is the highest, which is 33N. As the bias increases, high temperature oxidation resistance behavior of the coating weakens first and then increases, the amount of large particles on the surface of the coating increases first and then decreases whereas the density of the coating decreases first and then increases, and adhesion strength of the coating to the substrate increases first and then weakens. The coating's quality is relatively poor when the bias is −200 V.
ISSN:0022-3115
1873-4820
DOI:10.1016/j.jnucmat.2017.10.001