Micro-transfer-printed narrow-linewidth III-V-on-Si double laser structure with a combined 110 nm tuning range

• Published in: Optics express Vol. 30; no. 22; pp. 39329 - 39339
• Main Authors: Soltanian, Emadreza, Muliuk, Grigorij, Uvin, Sarah, Wang, Dongbo, Lepage, Guy, Verheyen, Peter, Van Campenhout, Joris, Ertl, Stefan, Rimböck, Johanna, Vaissiere, Nicolas, Néel, Delphine, Ramirez, Joan, Decobert, Jean, Kuyken, Bart, Zhang, Jing, Roelkens, Gunther
• Format: Journal Article
• Language: English
• Published: 24.10.2022

In this work, we demonstrate for the first time a narrow-linewidth III-V-on-Si double laser structure with more than a 110 nm wavelength tuning range realized using micro-transfer printing ( µ TP) technology. Two types of pre-fabricated III-V semiconductor optical amplifiers (SOAs) with a photolumin...