Optimization of the Heat Treatment and Tribological Properties of 2024 and 7075 Aluminium Alloys

This paper describes two stages of optimization of the properties of 2024 and 7075 aluminium alloys, in particular their resistance to pitting by first T6, T6I6 or T6I4 treatment, and second increase its tribological properties by depositing by RF PACVD method a gradient coating of high adhesion to...

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Published inArchives of metallurgy and materials Vol. 58; no. 2; pp. 535 - 540
Main Authors Kaczmarek, L, Steglinski, M, Sawicki, J, Swiniarski, J, Batory, D, Kyziol, K, Kolodziejczyk, L, Szymanski, W, Zawadzki, P, Kottfer, D
Format Journal Article
LanguageEnglish
Published Warsaw Polish Academy of Sciences 01.06.2013
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Summary:This paper describes two stages of optimization of the properties of 2024 and 7075 aluminium alloys, in particular their resistance to pitting by first T6, T6I6 or T6I4 treatment, and second increase its tribological properties by depositing by RF PACVD method a gradient coating of high adhesion to the substrate. Quantitative microstructural characteristics reveals that it is possible to increase hardness (up to 190HV for 7075 alloy) with relatively high yield strength (520 MPa) and high ultimate elongation (about 20%) by optimizing dispersion of precipitates using two-stage artificial aging process. Next to eliminate forming of thin Al[2]O[3] layer with relatively poor adhesion to the aluminium substrate, gradient a-C: H/Ti layers synthesis hybrid plasma chemical RF PACVD reactor equipped with pulsed magnetron sputtering system was used. Using such configuration enables forming a thick and highly adherent diamond-like carbon layer on aluminium surface with low coefficient of friction (0.05), at a substrate temperature below 470K. Due to application of Ti magnetron cathode it was possible to improve the adhesion strength up to 30mN of diamond-like carbon layer to the covered substrate. Influence of deposition parameters on microhardness profile as well as adhesion and morphology were determined by nanotest and AFM, respectively.
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ISSN:1733-3490
2300-1909
DOI:10.2478/amm-2013-0032