Sn thin film growth on Si(1 1 1) surface studied by CAICISS

Using coaxial impact–collision ion scattering spectroscopy, we have investigated Sn thin film growth on Si(1 1 1)7×7 and Si(1 1 1)√3×√3–Sn surfaces at room temperature. Sn grows epitaxially with body-centered-tetragonal structure (β-Sn) both on Si(1 1 1)7×7 surface and √3×√3-Sn surface. However, the...

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Published inSurface science Vol. 515; no. 1; pp. 199 - 204
Main Authors Ryu, J.T, Katayama, M, Oura, K
Format Journal Article
LanguageEnglish
Published Lausanne Elsevier B.V 01.08.2002
Amsterdam Elsevier Science
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Abstract Using coaxial impact–collision ion scattering spectroscopy, we have investigated Sn thin film growth on Si(1 1 1)7×7 and Si(1 1 1)√3×√3–Sn surfaces at room temperature. Sn grows epitaxially with body-centered-tetragonal structure (β-Sn) both on Si(1 1 1)7×7 surface and √3×√3-Sn surface. However, these epitaxial Sn layers exhibit markedly different growth orientations; the Sn layers on the Si(1 1 1)7×7 substrates have β-Sn(1 0 0) 〈0 1 1〉 //Si(1 1 1) 〈0 1 ̄ 1〉 and β-Sn(1 0 0) 〈0 1 0〉 //Si(1 1 1) 〈 1 ̄ 1 ̄ 2〉 orientations, while those on the √3×√3-Sn surface have β-Sn(1 0 0) 〈0 1 0〉 // Si(1 1 1) 〈0 1 ̄ 1〉 and β-Sn(1 0 0) 〈0 1 1〉 // Si(1 1 1) 〈 1 ̄ 1 ̄ 2〉 ones. These results reveal that the growth orientation of the epitaxial Sn layers is rotated by 30° with regard to that on a clean Si(1 1 1) surface by the presence of the √3×√3-Sn phase at the initial stage of the Sn growth.
AbstractList Using coaxial impact–collision ion scattering spectroscopy, we have investigated Sn thin film growth on Si(1 1 1)7×7 and Si(1 1 1)√3×√3–Sn surfaces at room temperature. Sn grows epitaxially with body-centered-tetragonal structure (β-Sn) both on Si(1 1 1)7×7 surface and √3×√3-Sn surface. However, these epitaxial Sn layers exhibit markedly different growth orientations; the Sn layers on the Si(1 1 1)7×7 substrates have β-Sn(1 0 0) 〈0 1 1〉 //Si(1 1 1) 〈0 1 ̄ 1〉 and β-Sn(1 0 0) 〈0 1 0〉 //Si(1 1 1) 〈 1 ̄ 1 ̄ 2〉 orientations, while those on the √3×√3-Sn surface have β-Sn(1 0 0) 〈0 1 0〉 // Si(1 1 1) 〈0 1 ̄ 1〉 and β-Sn(1 0 0) 〈0 1 1〉 // Si(1 1 1) 〈 1 ̄ 1 ̄ 2〉 ones. These results reveal that the growth orientation of the epitaxial Sn layers is rotated by 30° with regard to that on a clean Si(1 1 1) surface by the presence of the √3×√3-Sn phase at the initial stage of the Sn growth.
Author Oura, K
Katayama, M
Ryu, J.T
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  organization: Oura Laboratory, Department of Electronic Engineering, Graduate School of Engineering, Osaka University, 2-1 Yamadaoka, Suita, Osaka 565-0871, Japan
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CitedBy_id crossref_primary_10_1103_PhysRevB_77_205410
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Issue 1
Keywords Polycrystalline thin films
Growth
Low energy ion scattering (LEIS)
Tin
Metallic films
Ion scattering spectroscopy
Silicon
Surface structure, morphology, roughness, and topography
Metallic thin films
Ion scattering
Growth mechanism
Heteroepitaxy
Polysilicon
Crystal faces
Solid-solid interfaces
Rough surfaces
Surface topography
Experimental study
Surface structure
Language English
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Elsevier Science
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Snippet Using coaxial impact–collision ion scattering spectroscopy, we have investigated Sn thin film growth on Si(1 1 1)7×7 and Si(1 1 1)√3×√3–Sn surfaces at room...
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SubjectTerms Condensed matter: structure, mechanical and thermal properties
Exact sciences and technology
Growth
Ion scattering spectroscopy
Low energy ion scattering (LEIS)
Metallic films
Physics
Polycrystalline thin films
Silicon
Solid surfaces and solid-solid interfaces
Surface structure and topography
Surface structure, morphology, roughness, and topography
Surfaces and interfaces; thin films and whiskers (structure and nonelectronic properties)
Tin
Title Sn thin film growth on Si(1 1 1) surface studied by CAICISS
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