Sn thin film growth on Si(1 1 1) surface studied by CAICISS
Using coaxial impact–collision ion scattering spectroscopy, we have investigated Sn thin film growth on Si(1 1 1)7×7 and Si(1 1 1)√3×√3–Sn surfaces at room temperature. Sn grows epitaxially with body-centered-tetragonal structure (β-Sn) both on Si(1 1 1)7×7 surface and √3×√3-Sn surface. However, the...
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Published in | Surface science Vol. 515; no. 1; pp. 199 - 204 |
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Main Authors | , , |
Format | Journal Article |
Language | English |
Published |
Lausanne
Elsevier B.V
01.08.2002
Amsterdam Elsevier Science New York, NY |
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Abstract | Using coaxial impact–collision ion scattering spectroscopy, we have investigated Sn thin film growth on Si(1
1
1)7×7 and Si(1
1
1)√3×√3–Sn surfaces at room temperature. Sn grows epitaxially with body-centered-tetragonal structure (β-Sn) both on Si(1
1
1)7×7 surface and √3×√3-Sn surface. However, these epitaxial Sn layers exhibit markedly different growth orientations; the Sn layers on the Si(1
1
1)7×7 substrates have β-Sn(1
0
0)
〈0
1
1〉
//Si(1
1
1)
〈0
1
̄
1〉
and β-Sn(1
0
0)
〈0
1
0〉
//Si(1
1
1)
〈
1
̄
1
̄
2〉
orientations, while those on the √3×√3-Sn surface have β-Sn(1
0
0)
〈0
1
0〉
// Si(1
1
1)
〈0
1
̄
1〉
and β-Sn(1
0
0)
〈0
1
1〉
// Si(1
1
1)
〈
1
̄
1
̄
2〉
ones. These results reveal that the growth orientation of the epitaxial Sn layers is rotated by 30° with regard to that on a clean Si(1
1
1) surface by the presence of the √3×√3-Sn phase at the initial stage of the Sn growth. |
---|---|
AbstractList | Using coaxial impact–collision ion scattering spectroscopy, we have investigated Sn thin film growth on Si(1
1
1)7×7 and Si(1
1
1)√3×√3–Sn surfaces at room temperature. Sn grows epitaxially with body-centered-tetragonal structure (β-Sn) both on Si(1
1
1)7×7 surface and √3×√3-Sn surface. However, these epitaxial Sn layers exhibit markedly different growth orientations; the Sn layers on the Si(1
1
1)7×7 substrates have β-Sn(1
0
0)
〈0
1
1〉
//Si(1
1
1)
〈0
1
̄
1〉
and β-Sn(1
0
0)
〈0
1
0〉
//Si(1
1
1)
〈
1
̄
1
̄
2〉
orientations, while those on the √3×√3-Sn surface have β-Sn(1
0
0)
〈0
1
0〉
// Si(1
1
1)
〈0
1
̄
1〉
and β-Sn(1
0
0)
〈0
1
1〉
// Si(1
1
1)
〈
1
̄
1
̄
2〉
ones. These results reveal that the growth orientation of the epitaxial Sn layers is rotated by 30° with regard to that on a clean Si(1
1
1) surface by the presence of the √3×√3-Sn phase at the initial stage of the Sn growth. |
Author | Oura, K Katayama, M Ryu, J.T |
Author_xml | – sequence: 1 givenname: J.T surname: Ryu fullname: Ryu, J.T email: jryu@taegu.ac.kr organization: Faculty of Computer and Communication Engineering, Taegu University, 15 Naeri, Jinryang, Kyungsan, Kyungbuk 712-714, South Korea – sequence: 2 givenname: M surname: Katayama fullname: Katayama, M email: katayama@ele.eng.osaka-u.ac.jp organization: Oura Laboratory, Department of Electronic Engineering, Graduate School of Engineering, Osaka University, 2-1 Yamadaoka, Suita, Osaka 565-0871, Japan – sequence: 3 givenname: K surname: Oura fullname: Oura, K organization: Oura Laboratory, Department of Electronic Engineering, Graduate School of Engineering, Osaka University, 2-1 Yamadaoka, Suita, Osaka 565-0871, Japan |
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CitedBy_id | crossref_primary_10_1103_PhysRevB_77_205410 crossref_primary_10_1063_1_3120764 crossref_primary_10_1002_admi_202201452 crossref_primary_10_1088_0022_3727_42_1_015305 crossref_primary_10_1002_pssr_202100137 crossref_primary_10_1088_0256_307X_37_9_096801 |
Cites_doi | 10.1016/S0169-4332(96)00819-7 10.1016/0022-0248(93)90656-H 10.1016/S0039-6028(01)00905-0 10.1016/0040-6090(96)08569-0 10.1016/0039-6028(89)90275-6 10.1016/S0169-4332(96)00148-1 10.1016/0039-6028(94)90628-9 10.1016/0168-583X(88)90699-4 10.1016/S0039-6028(99)00974-7 10.1016/S0169-4332(00)00212-9 10.1016/0039-6028(90)90456-I 10.1116/1.576029 10.1016/0022-0248(92)90675-9 10.1016/0168-583X(88)90702-1 10.1143/JJAP.30.L1978 10.1016/0039-6028(94)90005-1 10.1143/JJAP.39.4374 10.1007/s003390051294 10.1016/0022-0248(95)00029-1 10.1016/S0169-4332(00)00218-X 10.1143/JJAP.29.L13 10.1116/1.587816 10.1016/S0169-4332(96)00132-8 10.1016/0039-6028(84)90380-7 10.1016/0039-6028(95)00749-0 |
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Keywords | Polycrystalline thin films Growth Low energy ion scattering (LEIS) Tin Metallic films Ion scattering spectroscopy Silicon Surface structure, morphology, roughness, and topography Metallic thin films Ion scattering Growth mechanism Heteroepitaxy Polysilicon Crystal faces Solid-solid interfaces Rough surfaces Surface topography Experimental study Surface structure |
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Snippet | Using coaxial impact–collision ion scattering spectroscopy, we have investigated Sn thin film growth on Si(1
1
1)7×7 and Si(1
1
1)√3×√3–Sn surfaces at room... |
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SubjectTerms | Condensed matter: structure, mechanical and thermal properties Exact sciences and technology Growth Ion scattering spectroscopy Low energy ion scattering (LEIS) Metallic films Physics Polycrystalline thin films Silicon Solid surfaces and solid-solid interfaces Surface structure and topography Surface structure, morphology, roughness, and topography Surfaces and interfaces; thin films and whiskers (structure and nonelectronic properties) Tin |
Title | Sn thin film growth on Si(1 1 1) surface studied by CAICISS |
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