Sn thin film growth on Si(1 1 1) surface studied by CAICISS
Using coaxial impact–collision ion scattering spectroscopy, we have investigated Sn thin film growth on Si(1 1 1)7×7 and Si(1 1 1)√3×√3–Sn surfaces at room temperature. Sn grows epitaxially with body-centered-tetragonal structure (β-Sn) both on Si(1 1 1)7×7 surface and √3×√3-Sn surface. However, the...
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Published in | Surface science Vol. 515; no. 1; pp. 199 - 204 |
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Main Authors | , , |
Format | Journal Article |
Language | English |
Published |
Lausanne
Elsevier B.V
01.08.2002
Amsterdam Elsevier Science New York, NY |
Subjects | |
Online Access | Get full text |
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Summary: | Using coaxial impact–collision ion scattering spectroscopy, we have investigated Sn thin film growth on Si(1
1
1)7×7 and Si(1
1
1)√3×√3–Sn surfaces at room temperature. Sn grows epitaxially with body-centered-tetragonal structure (β-Sn) both on Si(1
1
1)7×7 surface and √3×√3-Sn surface. However, these epitaxial Sn layers exhibit markedly different growth orientations; the Sn layers on the Si(1
1
1)7×7 substrates have β-Sn(1
0
0)
〈0
1
1〉
//Si(1
1
1)
〈0
1
̄
1〉
and β-Sn(1
0
0)
〈0
1
0〉
//Si(1
1
1)
〈
1
̄
1
̄
2〉
orientations, while those on the √3×√3-Sn surface have β-Sn(1
0
0)
〈0
1
0〉
// Si(1
1
1)
〈0
1
̄
1〉
and β-Sn(1
0
0)
〈0
1
1〉
// Si(1
1
1)
〈
1
̄
1
̄
2〉
ones. These results reveal that the growth orientation of the epitaxial Sn layers is rotated by 30° with regard to that on a clean Si(1
1
1) surface by the presence of the √3×√3-Sn phase at the initial stage of the Sn growth. |
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ISSN: | 0039-6028 1879-2758 |
DOI: | 10.1016/S0039-6028(02)01885-X |