Sn thin film growth on Si(1 1 1) surface studied by CAICISS

Using coaxial impact–collision ion scattering spectroscopy, we have investigated Sn thin film growth on Si(1 1 1)7×7 and Si(1 1 1)√3×√3–Sn surfaces at room temperature. Sn grows epitaxially with body-centered-tetragonal structure (β-Sn) both on Si(1 1 1)7×7 surface and √3×√3-Sn surface. However, the...

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Bibliographic Details
Published inSurface science Vol. 515; no. 1; pp. 199 - 204
Main Authors Ryu, J.T, Katayama, M, Oura, K
Format Journal Article
LanguageEnglish
Published Lausanne Elsevier B.V 01.08.2002
Amsterdam Elsevier Science
New York, NY
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Summary:Using coaxial impact–collision ion scattering spectroscopy, we have investigated Sn thin film growth on Si(1 1 1)7×7 and Si(1 1 1)√3×√3–Sn surfaces at room temperature. Sn grows epitaxially with body-centered-tetragonal structure (β-Sn) both on Si(1 1 1)7×7 surface and √3×√3-Sn surface. However, these epitaxial Sn layers exhibit markedly different growth orientations; the Sn layers on the Si(1 1 1)7×7 substrates have β-Sn(1 0 0) 〈0 1 1〉 //Si(1 1 1) 〈0 1 ̄ 1〉 and β-Sn(1 0 0) 〈0 1 0〉 //Si(1 1 1) 〈 1 ̄ 1 ̄ 2〉 orientations, while those on the √3×√3-Sn surface have β-Sn(1 0 0) 〈0 1 0〉 // Si(1 1 1) 〈0 1 ̄ 1〉 and β-Sn(1 0 0) 〈0 1 1〉 // Si(1 1 1) 〈 1 ̄ 1 ̄ 2〉 ones. These results reveal that the growth orientation of the epitaxial Sn layers is rotated by 30° with regard to that on a clean Si(1 1 1) surface by the presence of the √3×√3-Sn phase at the initial stage of the Sn growth.
ISSN:0039-6028
1879-2758
DOI:10.1016/S0039-6028(02)01885-X