Hydrogen-modulated Ar/CH4 HWP-CVD for fast preparation of multi-wall carbon nanotube arrays with high specific capacitance

• Published in: Diamond and related materials Vol. 109; p. 108067
• Main Authors: Ji, Peiyu, Chen, Jiali, Huang, Tianyuan, Zhuge, Lanjian, Wu, Xuemei
• Format: Journal Article
• Language: English
• Published: Amsterdam Elsevier B.V 01.11.2020; Elsevier BV
• Subjects: Arrays; Aspect ratio; Capacitance; Chemical vapor deposition; Electrochemical performances; Helicon wave plasma; High growth rate; Multi wall carbon nanotubes; Multiwalled carbon nanotube arrays; Room temperature; Substrates; High growth rate; Helicon wave plasma; Multiwalled carbon nanotube arrays; Electrochemical performances
• ISSN: 0925-9635; 1879-0062
• DOI: 10.1016/j.diamond.2020.108067

Two-dimensional Multiwalled Carbon Nanotube arrays (MWCNTs) were prepared by a novel high-density helicon wave plasma chemical vapor deposition (HWP-CVD) at room temperature. Preliminary studies show that the MWCNTs prepared by this method has strong orientation and is perpendicular to the substrate surface, and exhibit a highly ordered array distribution. The addition of hydrogen can effectively improve the growth rate of MWCNTs and increase the aspect ratio. The height and aspect ratio of MWCNTs can be effectively increased with the increase of growth time. Electrochemical investigation indicated that MWCNTs have high specific capacitance (1.96 mF/cm−2) and excellent rate capability (81.6%). [Display omitted] •Study on MWCNTs prepared by a novel high-density HWP-CVD for the first time.•Specific capacitance performance and deposition rate of MWCNTs prepared by hydrogen modulated Ar/CH4 HWP-CVD are improved by 11.8 and 1.7 times, respectively.•The growth model of the preparation of MWCNTs for HWP-CVD is proposed.•MWCNTs have excellent electrochemical performance, which is a potential for energy conversion and energy storage.