Large area, production MOCVD rotating disk reactor development and characteristics

A report on the utilization of three-dimensional Navier-Stokes flow modelling for the rapid development of large scale production Rotating Disk Reactor is presented. In particular, the influence of equipment design and deposition process parameters on flow and temperature uniformity and on process c...

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Bibliographic Details
Published inMicroelectronics Vol. 25; no. 8; pp. 757 - 765
Main Authors Tompa, G.S., Breiland, W.G., Gurary, A., Zawadzki, P.A., Evans, G.H., Esherick, P., Kroll, B., Stall, R.A.
Format Journal Article
LanguageEnglish
Published Elsevier Ltd 01.11.1994
Subjects
Computer simulation
Flow of fluids
Fluid dynamics
Heat transfer
Metallorganic chemical vapor deposition
Navier Stokes equations
Optoelectronic devices
Rotating disks
Thermocouples
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Summary:A report on the utilization of three-dimensional Navier-Stokes flow modelling for the rapid development of large scale production Rotating Disk Reactor is presented. In particular, the influence of equipment design and deposition process parameters on flow and temperature uniformity and on process characteristics are analyzed.
Bibliography:ObjectType-Article-2
SourceType-Scholarly Journals-1
ObjectType-Feature-1
content type line 23
ISSN:1879-2391
0026-2692
1879-2391
DOI:10.1016/0026-2692(94)90139-2