Thermally tunable optical filter with crystalline silicon as cavity

• Published in: Optics communications Vol. 244; no. 1-6; pp. 167 - 170
• Main Authors: Li, C.B., Zuo, Y.H., Cheng, B.W., Mao, R.W., Zhao, L., Shi, W.H., Luo, L.P., Yu, J.Z., Wang, Q.M.
• Format: Journal Article
• Language: English
• Published: Amsterdam Elsevier B.V 03.01.2005; Elsevier Science
• Subjects: Applied sciences; Back hole; Circuit properties; Electric, optical and optoelectronic circuits; Electronics; Exact sciences and technology; Filters, zone plates, and polarizers; Fundamental areas of phenomenology (including applications); Integrated optics. Optical fibers and wave guides; Optical and optoelectronic circuits; Optical elements, devices, and systems; Optics; Other integrated-optical elements and systems; Physics; SOI; Thermally tunable filter; Back hole; Thermally tunable filter; 78. 20. Nv; 42. 79. Ci; SOI; Integrated optics; Scanning electron microscopy; Experimental study; Tuning; Silicon on insulator technology; Engraving; Optical filter; Manufacturing process; Tunable filter; Silicon; Design for manufacture; Photolithography; MESA technology
• ISSN: 0030-4018; 1873-0310
• DOI: 10.1016/j.optcom.2004.09.034

A novel method to fabricate a thermally tunable filter with a tuning range of 26 nm from 1.504 to 1.530 μm is reported. The high-reflectivity bottom mirror is deposited in the hole formed by anisotropically etching in the basic solution from the backside of the slice with the buried SiO2 layer in silicon-on-insulator substrate as the etching-stop layer. Because of the formation of the mesa and the removing of the substrate of the hole, the power from the metal heater can be more effectively consumed in the crystalline silicon cavity. So it lowers the power consumption and the filter has a higher tuning range.