Characterization and modeling of a CMOS-compatible MEMS technology

• Published in: Sensors and actuators. A, Physical Vol. 74; no. 1; pp. 143 - 147
• Main Authors: Latorre, Laurent, Nouet, Pascal, Bertrand, Yves, Hazard, Philippe, Pressecq, Francis
• Format: Journal Article Conference Proceeding
• Language: English
• Published: Lausanne Elsevier B.V 20.04.1999; Elsevier Science
• Subjects: Applied sciences; Cross-disciplinary physics: materials science; rheology; Design. Technologies. Operation analysis. Testing; Electronics; Exact sciences and technology; Front-side bulk micromachining (FSBM); General equipment and techniques; Instruments, apparatus, components and techniques common to several branches of physics and astronomy; Integrated circuits; Materials science; Mechanical properties; Micro-electromechanical sensors; Microelectronics: LSI, VLSI, ULSI; integrated circuit fabrication technology; Modeling; Physics; Semiconductor electronics. Microelectronics. Optoelectronics. Solid state devices; Sensors (chemical, optical, electrical, movement, gas, etc.); remote sensing; Simulation; Test structures; Treatment of materials and its effects on microstructure and properties; Mechanical properties; Front-side bulk micromachining (FSBM); Micro-electromechanical sensors; Simulation; Modeling; Test structures; Electromechanical device; U shape; Bulk service; Micromachining; MOS structure; Modelling; Experimental study; Microsensors; Cantilever beam
• ISSN: 0924-4247; 1873-3069
• DOI: 10.1016/S0924-4247(98)00345-8

In this paper we present a new methodology for efficient electromechanical characterization of a CMOS-compatible micro-electro mechanical sensors (MEMS) technology. Using an original test structure, the so-called `U-shape cantilever beam', we are able to determine all mechanical characteristics of force sensors constituted with elementary beams in a given technology. A complete set of electromechanical relations that can be used for the design of Microsystems have been also developed.