Interdigitated microelectrode arrays based on sputtered carbon thin-films

Thin-film carbon microelectrodes deposited by RF sputtering onto a Si/Si 3N 4 substrate are presented. By optimizing the deposition parameters, films showing low resistivity (10 −3 Ω cm) and good adhesion are achieved. Physical, spectroscopic and electrochemical characterizations are carried out. Th...

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Published inSensors and actuators. B, Chemical Vol. 35; no. 1; pp. 247 - 254
Main Authors Fiaccabrino, G.C, Tang, X.-M, Skinner, N, de Rooij, N.F, Koudelka-Hep, M
Format Journal Article Conference Proceeding
LanguageEnglish
Published Lausanne Elsevier B.V 01.09.1996
Amsterdam Elsevier
New York, NY
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Summary:Thin-film carbon microelectrodes deposited by RF sputtering onto a Si/Si 3N 4 substrate are presented. By optimizing the deposition parameters, films showing low resistivity (10 −3 Ω cm) and good adhesion are achieved. Physical, spectroscopic and electrochemical characterizations are carried out. The electrocatalytical properties of the carbon thin-films are assessed with and without surface activation. Successful patterning in O 2 plasma is demonstrated by the fabrication of interdigitated microelectrode arrays featuring a resolution of 2 μm. The analytical performance of the interdigitated microelectrodes is illustrated by the detection of dopamine over a concentration range of 50 nM to 100 μM.
ISSN:0925-4005
1873-3077
DOI:10.1016/S0925-4005(97)80063-9