Interdigitated microelectrode arrays based on sputtered carbon thin-films
Thin-film carbon microelectrodes deposited by RF sputtering onto a Si/Si 3N 4 substrate are presented. By optimizing the deposition parameters, films showing low resistivity (10 −3 Ω cm) and good adhesion are achieved. Physical, spectroscopic and electrochemical characterizations are carried out. Th...
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Published in | Sensors and actuators. B, Chemical Vol. 35; no. 1; pp. 247 - 254 |
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Main Authors | , , , , |
Format | Journal Article Conference Proceeding |
Language | English |
Published |
Lausanne
Elsevier B.V
01.09.1996
Amsterdam Elsevier New York, NY |
Subjects | |
Online Access | Get full text |
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Summary: | Thin-film carbon microelectrodes deposited by RF sputtering onto a Si/Si
3N
4 substrate are presented. By optimizing the deposition parameters, films showing low resistivity (10
−3 Ω cm) and good adhesion are achieved. Physical, spectroscopic and electrochemical characterizations are carried out. The electrocatalytical properties of the carbon thin-films are assessed with and without surface activation. Successful patterning in O
2 plasma is demonstrated by the fabrication of interdigitated microelectrode arrays featuring a resolution of 2 μm. The analytical performance of the interdigitated microelectrodes is illustrated by the detection of dopamine over a concentration range of 50 nM to 100 μM. |
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ISSN: | 0925-4005 1873-3077 |
DOI: | 10.1016/S0925-4005(97)80063-9 |