Room-temperature deposition of crystalline patterned ZnO films by confined dewetting lithography

In this work patterned ZnO films were prepared at room-temperature by deposition of ∼5 nm size ZnO nanoparticles using confined dewetting lithography, a process which induces their assembly, by drying a drop of ZnO colloidal dispersion between a floating template and the substrate. Crystalline ZnO n...

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Published inApplied surface science Vol. 256; no. 11; pp. 3386 - 3389
Main Authors Sepulveda-Guzman, S., Reeja-Jayan, B., De la Rosa, E., Ortiz-Mendez, U., Reyes-Betanzo, C., Cruz-Silva, R., Jose-Yacaman, M.
Format Journal Article
LanguageEnglish
Published Amsterdam Elsevier B.V 15.03.2010
Elsevier
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Summary:In this work patterned ZnO films were prepared at room-temperature by deposition of ∼5 nm size ZnO nanoparticles using confined dewetting lithography, a process which induces their assembly, by drying a drop of ZnO colloidal dispersion between a floating template and the substrate. Crystalline ZnO nanoparticles exhibit a strong visible (525 nm) light emission upon UV excitation ( λ = 350 nm). The resulting films were characterized by scanning electron microscopy (SEM) and atomic force microscope (AFM). The method described herein presents a simple and low cost method to prepare crystalline ZnO films with geometric patterns without additional annealing. Such transparent conducting films are attractive for applications like light emitting diodes (LEDs). As the process is carried out at room temperature, the patterned crystalline ZnO films can even be deposited on flexible substrates.
ISSN:0169-4332
1873-5584
DOI:10.1016/j.apsusc.2009.12.039