The novel usage of spectroscopic ellipsometry for the development of amorphous Si solar cells
We present the novel use of spectroscopic ellipsometry (SE) for the development of a-Si:H solar cell. SE is a very fast and useful tool to measure various optical properties of thin film. In the case of a-Si:H thin film analysis, generally, SE is used to estimate the film thickness, roughness, void...
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Published in | Solar energy materials and solar cells Vol. 95; no. 1; pp. 142 - 145 |
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Main Authors | , , , , |
Format | Journal Article Conference Proceeding |
Language | English |
Published |
Amsterdam
Elsevier B.V
2011
Elsevier |
Subjects | |
Online Access | Get full text |
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Summary: | We present the novel use of spectroscopic ellipsometry (SE) for the development of a-Si:H solar cell. SE is a very fast and useful tool to measure various optical properties of thin film. In the case of a-Si:H thin film analysis, generally, SE is used to estimate the film thickness, roughness, void fraction, optical constants such as (
n,
k), and so forth. In this study, optical parameters from SE measurements were analyzed with relation to structural and electrical properties of a-Si:H thin film for solar cell. By analyzing IR absorption spectra and conductivity measurements, it was affirmed that <
ε
2> and parameter
A by Tauc–Lorentz model fitting of SE data are representative parameters qualifying a-Si:H thin film, and that they have close relationships with FF and light induced degradation property of solar cells. Based on the analysis, solar cells that have i-layers with various
E
g
were optimized. By this research, easier and faster methodology to develop a-Si:H thin film for thin film Si solar cells using SE measurements was established. |
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ISSN: | 0927-0248 1879-3398 |
DOI: | 10.1016/j.solmat.2010.04.054 |