Sodium distribution in thin-film anodic bonding
Depth profiles of the sodium distribution at bonded interfaces of silicon wafers, bonded with an intermediate borosilicate glass film, are recorded by secondary ion mass spectrometry (SIMS). A layer of dielectric material is present under the thin layer of glass, either a layer of silicon oxide or a...
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Published in | Sensors and actuators. A, Physical Vol. 92; no. 1; pp. 223 - 228 |
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Main Authors | , , , , |
Format | Journal Article Conference Proceeding |
Language | English |
Published |
Lausanne
Elsevier B.V
01.08.2001
Elsevier Science |
Subjects | |
Online Access | Get full text |
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Summary: | Depth profiles of the sodium distribution at bonded interfaces of silicon wafers, bonded with an intermediate borosilicate glass film, are recorded by secondary ion mass spectrometry (SIMS). A layer of dielectric material is present under the thin layer of glass, either a layer of silicon oxide or a combined layer of silicon oxide and silicon nitride. The glass layers are sputtered onto the wafers. Sodium is found to pile-up at interfaces. In the structures where a layer of silicon nitride is included, the amount of pile-up is reduced. Sputtered glass films are analysed with energy dispersive X-ray spectroscopy (EDX), and with a microprobe, in order to estimate the content of sodium in the films. Glass films deposited by e-beam evaporation are included in the EDX measurements for comparison purposes. |
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ISSN: | 0924-4247 1873-3069 |
DOI: | 10.1016/S0924-4247(01)00580-5 |