Characterization of ZnO thin film synthesized on alumina-rich spinel substrate by magnetron sputtering

Zinc oxide (ZnO) thin film has been epitaxially grown on (1 1 1) Mg 0.4Al 2.4O 4 substrate by RF-magnetron sputtering. In resonant Raman scattering, higher-order longitudinal optical phonon modes were clearly observed, revealing high optical quality of the ZnO film. Optical absorption indicated a vi...

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Bibliographic Details
Published inApplied surface science Vol. 256; no. 16; pp. 4934 - 4937
Main Authors Tang, Huili, Xu, Jun, Li, Hongjun, Dong, Yongjun, Wang, Yinzhen, Wu, Feng
Format Journal Article
LanguageEnglish
Published Amsterdam Elsevier B.V 01.06.2010
Elsevier
Subjects
Condensed matter: electronic structure, electrical, magnetic, and optical properties
Condensed matter: structure, mechanical and thermal properties
Cross-disciplinary physics: materials science; rheology
Exact sciences and technology
Magnetron sputtering
Physics
Semiconductor compounds
ZnO thin film
Semiconductor compounds
Magnetron sputtering
ZnO thin film
Aluminium oxide
Inorganic compounds
Semiconductor materials
Transition element compounds
Film growth
Thin films
Magnetrons
Cathode sputtering
Spinels
Zinc oxide
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Summary:Zinc oxide (ZnO) thin film has been epitaxially grown on (1 1 1) Mg 0.4Al 2.4O 4 substrate by RF-magnetron sputtering. In resonant Raman scattering, higher-order longitudinal optical phonon modes were clearly observed, revealing high optical quality of the ZnO film. Optical absorption indicated a visible exciton absorption at room temperature. The near band edge emission showed a red shift due to the shrinkage of the band gap with increasing the temperature.
ISSN:0169-4332
1873-5584
DOI:10.1016/j.apsusc.2010.03.005