Atomic force microscopy investigation of the effects of annealing on amorphous carbon nitride films deposited by r.f. magnetron sputtering

• Published in: Diamond and related materials Vol. 8; no. 6; pp. 993 - 995
• Main Authors: Prioli, R, Zanette, S.I, Caride, A.O, Lacerda, M.M, Freire, F.L
• Format: Journal Article
• Language: English
• Published: Amsterdam Elsevier B.V 01.06.1999; Elsevier
• Subjects: Annealing; Atomic force microscopy; Carbon nitride; Condensed matter: structure, mechanical and thermal properties; Exact sciences and technology; Mechanical and acoustical properties; Physical properties of thin films, nonelectronic; Physics; Solid surfaces and solid-solid interfaces; Surface structure and topography; Surfaces and interfaces; thin films and whiskers (structure and nonelectronic properties); Tribology; Atomic force microscopy; Annealing; Carbon nitride; Tribology; Thin films; Amorphous material; Inorganic compounds; Topography; Roughness; Surfaces; Friction factor; Carbon nitrides; Experimental study; Thermal annealing
• ISSN: 0925-9635; 1879-0062
• DOI: 10.1016/S0925-9635(98)00453-1

Atomic force microscopy is used to study the effects of thermal annealing on the surface topography and the tribological properties of amorphous carbon nitride thin films deposited by r.f. magnetron sputtering. The results show that the surface roughness decreases with increasing annealing temperature. The friction coefficients at the interface between a Si 3N 4 tip and the amorphous carbon nitride films surface decrease with increasing smoothness of the surface.