Some trends in preparing film structures by ion beam methods

Film deposition by ion beam sputtering or condensation offers interesting possibilities for the preparation of special layer structures because activation energy can be supplied to the growing film in a defined manner. Some results of recent work on the ion beam sputtering of Nb x Ge y under ultrahi...

Full description

Saved in:
Bibliographic Details
Published inThin solid films Vol. 50; pp. 135 - 144
Main Authors Gautherin, G., Weissmantel, Chr
Format Journal Article
LanguageEnglish
Published Elsevier B.V 01.05.1978
Online AccessGet full text

Cover

More Information
Summary:Film deposition by ion beam sputtering or condensation offers interesting possibilities for the preparation of special layer structures because activation energy can be supplied to the growing film in a defined manner. Some results of recent work on the ion beam sputtering of Nb x Ge y under ultrahigh vacuum conditions using in situ diagnostics and on the dual beam deposition of Si 3N 4 and diamond-like carbon are presented. Further trends are discussed in connection with methods of condensing low energy ions.
Bibliography:ObjectType-Article-2
SourceType-Scholarly Journals-1
ObjectType-Feature-1
content type line 23
ISSN:0040-6090
1879-2731
DOI:10.1016/0040-6090(78)90099-8