The growth of Sm on Mo(110) studied by surface X-ray diffraction

X-ray diffraction measurements have been made in real time during the deposition of the rare earth Sm on the non-alloying substrate Mo(110). For growth on the clean surface at 300 K, the variation of the specularly reflected X-ray intensity with deposition time is consistent with the completion of a...

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Published inPhysica. B, Condensed matter Vol. 221; no. 1; pp. 86 - 89
Main Authors Nicklin, C.L., Norris, C., Steadman, P., Taylor, J.S.G., Howes, P.B.
Format Journal Article
LanguageEnglish
Published Elsevier B.V 01.04.1996
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Summary:X-ray diffraction measurements have been made in real time during the deposition of the rare earth Sm on the non-alloying substrate Mo(110). For growth on the clean surface at 300 K, the variation of the specularly reflected X-ray intensity with deposition time is consistent with the completion of a trivalent monolayer with an atomic density of 96% of a (0001) layer in bulk Sm. The second layer has a separation which agrees, within error, with the formation of a divalent layer on top of the trivalent first layer. Further growth is suggested to be increasingly disordered with the formation of multilayer structures.
Bibliography:ObjectType-Article-2
SourceType-Scholarly Journals-1
ObjectType-Feature-1
content type line 23
ISSN:0921-4526
1873-2135
DOI:10.1016/0921-4526(95)00909-4