Millimeter-wave silicon MMIC interconnect and coupler using multilayer polyimide technology

This paper reports our latest progress in developing low-loss and low-crosstalk silicon MMIC interconnects for millimeter-wave applications. The proposed silicon/metal/polyimide (SIMPOL) structure based on multilayer polyimide technology is extremely effective in reducing noise crosstalk, and also p...

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Bibliographic Details
Published inIEEE transactions on microwave theory and techniques Vol. 48; no. 9; pp. 1482 - 1487
Main Authors Juno Kim, Yongxi Qian, Guojin Feng, Pingxi Ma, Chang, M.F., Itoh, T.
Format Journal Article
LanguageEnglish
Published New York IEEE 01.09.2000
The Institute of Electrical and Electronics Engineers, Inc. (IEEE)
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Summary:This paper reports our latest progress in developing low-loss and low-crosstalk silicon MMIC interconnects for millimeter-wave applications. The proposed silicon/metal/polyimide (SIMPOL) structure based on multilayer polyimide technology is extremely effective in reducing noise crosstalk, and also provides very low line loss, even at the millimeter-wave regime. The measurement results of the developed SIMPOL structures demonstrate extremely low noise crosstalk (<-40 dB) in the entire frequency range (up to 50 GHz), which is limited by the dynamic range of the measurement equipment, and excellent insertion loss (<-0,25 dB/mm) up to 45 GHz. In addition, the SIMPOL concept is applied for the first time successfully in the design and fabrication of branch-line hybrids at millimeter-wave frequencies, 30 and 37 GHz.
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ISSN:0018-9480
1557-9670
DOI:10.1109/22.868998