New approach to nanocomposites of polyimides containing polyhedral oligomeric silsesquioxane for dielectric applications

Low dielectric constant nanocomposites of polyimides with grafted methacrylate side chains containing polyhedral oligomeric silsesquioxane (POSS) were successfully synthesized by thermally initiated free-radical graft copolymerization of methacrylcyclopentyl-POSS (MA-POSS) with the ozone-preactivate...

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Bibliographic Details
Published inMaterials letters Vol. 58; no. 29; pp. 3716 - 3719
Main Authors Chen, Yiwang, Kang, En-Tang
Format Journal Article
LanguageEnglish
Published Elsevier B.V 01.11.2004
Subjects
Dielectrics
Graft polymerization
Nanocomposites
Polyimide
POSS
Polyimide
POSS
Dielectrics
Nanocomposites
Graft polymerization
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Summary:Low dielectric constant nanocomposites of polyimides with grafted methacrylate side chains containing polyhedral oligomeric silsesquioxane (POSS) were successfully synthesized by thermally initiated free-radical graft copolymerization of methacrylcyclopentyl-POSS (MA-POSS) with the ozone-preactivated poly(amic acid), followed by thermal imidization. The dielectric constant of the film can be tuned by varying the molar ratio of the grafted MA-POSS side chains in the copolymer.
Bibliography:ObjectType-Article-2
SourceType-Scholarly Journals-1
ObjectType-Feature-1
content type line 23
ISSN:0167-577X
1873-4979
DOI:10.1016/j.matlet.2004.08.001