Diamond synthesis in a low-pressure flat flame

A low-pressure flat flame burner was constructed and used to grow diamond films on silicon and molybdenum substrates in oxygen-acetylene flames at 40 Torr. Both isolated, well faceted diamond particles and continuous films covering the entire substrate (12 cm 2) were grown. Nucleation was found to b...

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Bibliographic Details
Published inThin solid films Vol. 212; no. 1; pp. 122 - 126
Main Authors Glumac, N.G., Goodwin, D.G.
Format Journal Article
LanguageEnglish
Published Elsevier B.V 15.05.1992
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Summary:A low-pressure flat flame burner was constructed and used to grow diamond films on silicon and molybdenum substrates in oxygen-acetylene flames at 40 Torr. Both isolated, well faceted diamond particles and continuous films covering the entire substrate (12 cm 2) were grown. Nucleation was found to be significantly enhanced by altering the flame conditions initially, thereby depositing a thin, non-diamond carbon layer onto the silicon substrates. This procedure was required to grow continuous films. Flame simulations were carried out, and explain why the flame stoichiometry required for diamond growth at low pressure differs significantly from that required at atmospheric pressure.
Bibliography:ObjectType-Article-2
SourceType-Scholarly Journals-1
ObjectType-Feature-1
content type line 23
ISSN:0040-6090
1879-2731
DOI:10.1016/0040-6090(92)90508-9