Transmission electron microscopy of heteroepitaxial layer structures
The characterization of heterostructural layers by transmission electron microscopy using cleaved wedge specimens proves to be a fast analysis method. Examples are given for GaAlAs/GaAs and strained GaInAs/GaAs layer systems. It is demonstrated that the (200) dark-field contrast of GaInAs/GaAs layer...
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Published in | Applied surface science Vol. 50; no. 1; pp. 19 - 27 |
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Main Author | |
Format | Journal Article Conference Proceeding |
Language | English |
Published |
Amsterdam
Elsevier B.V
01.06.1991
Elsevier Science |
Subjects | |
Online Access | Get full text |
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Summary: | The characterization of heterostructural layers by transmission electron microscopy using cleaved wedge specimens proves to be a fast analysis method. Examples are given for GaAlAs/GaAs and strained GaInAs/GaAs layer systems. It is demonstrated that the (200) dark-field contrast of GaInAs/GaAs layers reverses at an In concentration of
x ≈ 0.47. Experimental high-resolution electron images of the edges of cleaved 90° wedges compare very well with computer-simulated images. Characteristic image features in GaAs and AlAs are explained by non-linear beam interactions and are shown to be sensitive to electron beam misalignment. These investigations are important to make a more precise assessment of interfaces possible. |
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ISSN: | 0169-4332 1873-5584 |
DOI: | 10.1016/0169-4332(91)90134-6 |