Transmission electron microscopy of heteroepitaxial layer structures

The characterization of heterostructural layers by transmission electron microscopy using cleaved wedge specimens proves to be a fast analysis method. Examples are given for GaAlAs/GaAs and strained GaInAs/GaAs layer systems. It is demonstrated that the (200) dark-field contrast of GaInAs/GaAs layer...

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Bibliographic Details
Published inApplied surface science Vol. 50; no. 1; pp. 19 - 27
Main Author Cerva, H.
Format Journal Article Conference Proceeding
LanguageEnglish
Published Amsterdam Elsevier B.V 01.06.1991
Elsevier Science
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Summary:The characterization of heterostructural layers by transmission electron microscopy using cleaved wedge specimens proves to be a fast analysis method. Examples are given for GaAlAs/GaAs and strained GaInAs/GaAs layer systems. It is demonstrated that the (200) dark-field contrast of GaInAs/GaAs layers reverses at an In concentration of x ≈ 0.47. Experimental high-resolution electron images of the edges of cleaved 90° wedges compare very well with computer-simulated images. Characteristic image features in GaAs and AlAs are explained by non-linear beam interactions and are shown to be sensitive to electron beam misalignment. These investigations are important to make a more precise assessment of interfaces possible.
ISSN:0169-4332
1873-5584
DOI:10.1016/0169-4332(91)90134-6