High thermal stability and fast operation speed phase-change memory devices containing Hf-doped Ge2Sb2Te5 films

•The increase of Hafnium content enhances the thermal stability of Ge2Sb2Te5.•Hafnium dopants suppress the process of crystallization.•Hafnium dopants reduce the size of faced-centered cubic phase Ge2Sb2Te5 grains.•Hafnium-doped Ge2Sb2Te5 phase-change memory device has fast operation speed and good...

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Published inMaterials letters Vol. 278; p. 128402
Main Authors Wang, Ruobing, Shen, Jiabin, Chen, Xin, Wang, Hao, Song, Sannian, Song, Zhitang
Format Journal Article
LanguageEnglish
Published Amsterdam Elsevier B.V 01.11.2020
Elsevier BV
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Summary:•The increase of Hafnium content enhances the thermal stability of Ge2Sb2Te5.•Hafnium dopants suppress the process of crystallization.•Hafnium dopants reduce the size of faced-centered cubic phase Ge2Sb2Te5 grains.•Hafnium-doped Ge2Sb2Te5 phase-change memory device has fast operation speed and good endurance. Ge2Sb2Te5 (GST) materials have been widely investigated for applying in phase-change memory (PCM). However, the low amorphous thermal properties limit its application in high-density memory devices, thus doping modified has been the subject of extensive studies in past decades. In this work, the amorphous thermal stability of GST can be significantly improved by doping hafnium elements without reducing operation speed. A higher crystallization temperature (~221 °C) and 10-year data retention temperature (~114 °C) are achieved in Hf0.04(Ge2Sb2Te5)0.96 alloy. The addition of Hf elements helps to suppress crystallization and decrease the grain size of rock-salt phase. Besides, the PCM cell based on Hf0.04(Ge2Sb2Te5)0.96 exhibits a faster operation speed (10 ns) than GST-based one and could be operated repeatedly for over 2́105 cycles, showing that Hf-doped GST is a promising material for PCM devices.
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content type line 14
ISSN:0167-577X
1873-4979
DOI:10.1016/j.matlet.2020.128402