Characterization of mirror-polished silicon wafers by Makyoh method

• Published in: Journal of crystal growth Vol. 103; no. 1; pp. 437 - 442
• Main Authors: Tokura, Seitaro, Fujino, Nobukatsu, Ninomiya, Masaharu, Masuda, Kenji
• Format: Journal Article Conference Proceeding
• Language: English
• Published: Amsterdam Elsevier B.V 01.06.1990; Elsevier
• Subjects: Condensed matter: structure, mechanical and thermal properties; Exact sciences and technology; Physics; Solid surfaces and solid-solid interfaces; Surface structure and topography; Surfaces and interfaces; thin films and whiskers (structure and nonelectronic properties)
• ISSN: 0022-0248; 1873-5002
• DOI: 10.1016/0022-0248(90)90223-8

Makyoh, the “Magic Mirror” is a very useful tool with which to visualize local irregularities of the surface of a mirror-like polished silicon wafer. Using the Makyoh method, bright and dark spots are visible in the image of wafers projected on an instrument screen. However, these spots have not yet been correlated to specific defects on a wafer surface. First, local convex-type defects on the mirror-like surface of silicon wafers are observed with Makyoh, a flatness tester and other micro surface measurement systems. Next, we report our attempts to create actrual convex and concave shapes on silicon wafer surfaces by intentionally varying polishing conditions, and which shapes are observed. We also discuss the relationship between silicon wafer flatness and the Makyoh magic mirror image.