Iodine doping in amorphous carbon thin-films for optoelectronic devices

• Published in: Physica. B, Condensed matter Vol. 376; pp. 316 - 319
• Main Authors: Omer, Ashraf M.M., Adhikari, Sudip, Adhikary, Sunil, Rusop, Mohamad, Uchida, Hideo, Umeno, Masayoshi, Soga, Tetsuo
• Format: Journal Article
• Language: English
• Published: Elsevier B.V 01.04.2006
• Subjects: Amorphous carbon; Iodine doping; Microwave surface wave plasma CVD; Optoelectronic properties; Iodine doping; Amorphous carbon; Optoelectronic properties; Microwave surface wave plasma CVD

We report the effects of iodine doping on the optical and structural properties of amorphous carbon thin-films grown on silicon and quartz substrates by microwave surface wave plasma chemical vapor deposition (CVD) at low temperature (<100 °C). For film deposition, we used Ar and CH 4 as plasma s...