Homogeneity of PVD hard coatings deposited on 3D parts

Hard coatings on the base of transition metal compounds (e.g. nitrides, carbides) are increasingly used in many fields of modern technology. Besides compounds with one metallic component (e.g. TiN, CrN) more and more multicomponent films are studied and used in application. The major problem in PVD...

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Bibliographic Details
Published inVacuum Vol. 45; no. 10; pp. 1019 - 1022
Main Authors Jehn, HA, Rother, B, Kappl, H
Format Journal Article Conference Proceeding
LanguageEnglish
Published Oxford Elsevier Ltd 01.10.1994
Elsevier
Subjects
Chemical vapor deposition (including plasma-enhanced cvd, mocvd, etc.)
Cross-disciplinary physics: materials science; rheology
Exact sciences and technology
Materials science
Methods of deposition of films and coatings; film growth and epitaxy
Physics
Reviews
Multi-element compounds
Technology
Physical vapor deposition
Homogeneity
Hard materials
Ion sources
Chemical composition
Crystal growth from vapors
Coatings
Crystal growth methods
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Summary:Hard coatings on the base of transition metal compounds (e.g. nitrides, carbides) are increasingly used in many fields of modern technology. Besides compounds with one metallic component (e.g. TiN, CrN) more and more multicomponent films are studied and used in application. The major problem in PVD coating of present paper discusses the different single and multisource PVD deposition techniques. Examples are given for the film properties on 3D parts and for multicomponent films deposited using different sources. Recent model calculations allow the prediction of local growth rates on the substrate and the in-depth distribution of the elemental concentration.
ISSN:0042-207X
1879-2715
DOI:10.1016/0042-207X(94)90011-6