The effect of the inclination of magnetic field lines on surface sputtering by plasma ions
In this paper the following is presented: 1. (I) the mathematical model which describes the outflux of positive and negative ions from a sputtered surface; 2. (II) the calculated probability for sputtered positive and negative ions to flow along magnetic field lines; 3. (III) the numerical results i...
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Published in | Journal of nuclear materials Vol. 137; no. 2; pp. 167 - 172 |
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Main Authors | , |
Format | Journal Article |
Language | English |
Published |
Amsterdam
Elsevier B.V
1986
Elsevier |
Subjects | |
Online Access | Get full text |
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Summary: | In this paper the following is presented:
1.
(I) the mathematical model which describes the outflux of positive and negative ions from a sputtered surface;
2.
(II) the calculated probability for sputtered positive and negative ions to flow along magnetic field lines;
3.
(III) the numerical results indicative of anomalous deep penetration of light impurities into the confined plasma due to carbon-and/or oxygen containing negative ions. |
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ISSN: | 0022-3115 1873-4820 |
DOI: | 10.1016/0022-3115(86)90047-4 |