The effect of the inclination of magnetic field lines on surface sputtering by plasma ions

In this paper the following is presented: 1. (I) the mathematical model which describes the outflux of positive and negative ions from a sputtered surface; 2. (II) the calculated probability for sputtered positive and negative ions to flow along magnetic field lines; 3. (III) the numerical results i...

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Bibliographic Details
Published inJournal of nuclear materials Vol. 137; no. 2; pp. 167 - 172
Main Authors Vasil'ev, V.V., Vojtsenya, V.S.
Format Journal Article
LanguageEnglish
Published Amsterdam Elsevier B.V 1986
Elsevier
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Summary:In this paper the following is presented: 1. (I) the mathematical model which describes the outflux of positive and negative ions from a sputtered surface; 2. (II) the calculated probability for sputtered positive and negative ions to flow along magnetic field lines; 3. (III) the numerical results indicative of anomalous deep penetration of light impurities into the confined plasma due to carbon-and/or oxygen containing negative ions.
ISSN:0022-3115
1873-4820
DOI:10.1016/0022-3115(86)90047-4