ITO film analyses by FTIR
Indium tin oxide thin films have been the subject of extensive research due to their attractive optical and electronic properties. The effects of essential processing steps carried out on these films which are used in layered semiconductor devices have been monitored by FTIR and the different absorp...
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Published in | Infrared physics & technology Vol. 36; no. 4; pp. 779 - 784 |
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Main Authors | , |
Format | Journal Article |
Language | English |
Published |
Amsterdam
Elsevier B.V
01.06.1995
Elsevier |
Subjects | |
Online Access | Get full text |
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Summary: | Indium tin oxide thin films have been the subject of extensive research due to their attractive optical and electronic properties. The effects of essential processing steps carried out on these films which are used in layered semiconductor devices have been monitored by FTIR and the different absorption spectra obtained indicate that changes are occurring in film composition. In electronics, important compositional changes are normally determined by electrical measurements which often destroy or irreversibly alter the films. Infrared measurements are rapid and non-destructive and so permit analyses through a number of fabrication steps. This technique therefore provides a means for the optimisation of these films. |
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ISSN: | 1350-4495 1879-0275 |
DOI: | 10.1016/1350-4495(95)91321-I |