Microlens arrays etched into glass and silicon

Microlens arrays fabricated by melting photoresist were transferred by reactive ion etching (RIE) into glass (SiO 2) and silicon (Si). By controlling the etching rates of the mask and the substrate material, radii of curvature and focal lengths within a wide range can be achieved. For example, glass...

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Bibliographic Details
Published inOptics and lasers in engineering Vol. 20; no. 2; pp. 97 - 107
Main Author Savander, Pekka
Format Journal Article
LanguageEnglish
Published Oxford Elsevier Ltd 1994
Elsevier
Subjects
Exact sciences and technology
Fundamental areas of phenomenology (including applications)
Lenses, prisms and mirrors
Optical elements, devices, and systems
Optics
Physics
Fabrication
Reactive ion etching
Microlens
Glass
Optics
Photoresists
Etching
Silicon
Experimental study
Lenses
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Summary:Microlens arrays fabricated by melting photoresist were transferred by reactive ion etching (RIE) into glass (SiO 2) and silicon (Si). By controlling the etching rates of the mask and the substrate material, radii of curvature and focal lengths within a wide range can be achieved. For example, glass lenses with diameter 120 μm and focal lengths between 500 μm and 1500 μm were made. The scaling possibilities of microlens arrays, given the use of RIE, are discussed.
ISSN:0143-8166
1873-0302
DOI:10.1016/0143-8166(94)90020-5