Polycrystalline diamond pressure microsensor

Diamond deposition processing and silicon photolithographic and etching techniques were used to create undoped diamond diaphragms a few millimetres in diameter and 5–10 microns thick. Delineated and electrically isolated doped diamond resistors nominally 100 microns wide by 500 microns long by 4 mic...

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Bibliographic Details
Published inDiamond and related materials Vol. 5; no. 1; pp. 86 - 92
Main Authors Davidson, J.L., Wur, D.R., Kang, W.P., Kinser, D.L., Kerns, D.V.
Format Journal Article
LanguageEnglish
Published Amsterdam Elsevier B.V 1996
Elsevier
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Summary:Diamond deposition processing and silicon photolithographic and etching techniques were used to create undoped diamond diaphragms a few millimetres in diameter and 5–10 microns thick. Delineated and electrically isolated doped diamond resistors nominally 100 microns wide by 500 microns long by 4 microns thick, with thick film silver-based interconnect are fabricated on top of the diaphragm. Zero strain values of the resistors are nominally a few hundred kΩ Isolation ratio is greater than 10 3. As the membrane is flexed by pressure, the ΔR R piezoresistance (PZR) of the diamond resistors was measured. Various PZR configurations and temperature behaviour were examined.
ISSN:0925-9635
1879-0062
DOI:10.1016/0925-9635(96)80010-0