Polycrystalline diamond pressure microsensor
Diamond deposition processing and silicon photolithographic and etching techniques were used to create undoped diamond diaphragms a few millimetres in diameter and 5–10 microns thick. Delineated and electrically isolated doped diamond resistors nominally 100 microns wide by 500 microns long by 4 mic...
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Published in | Diamond and related materials Vol. 5; no. 1; pp. 86 - 92 |
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Main Authors | , , , , |
Format | Journal Article |
Language | English |
Published |
Amsterdam
Elsevier B.V
1996
Elsevier |
Subjects | |
Online Access | Get full text |
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Summary: | Diamond deposition processing and silicon photolithographic and etching techniques were used to create undoped diamond diaphragms a few millimetres in diameter and 5–10 microns thick. Delineated and electrically isolated doped diamond resistors nominally 100 microns wide by 500 microns long by 4 microns thick, with thick film silver-based interconnect are fabricated on top of the diaphragm. Zero strain values of the resistors are nominally a few hundred kΩ Isolation ratio is greater than 10
3. As the membrane is flexed by pressure, the
ΔR
R
piezoresistance (PZR) of the diamond resistors was measured. Various PZR configurations and temperature behaviour were examined. |
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ISSN: | 0925-9635 1879-0062 |
DOI: | 10.1016/0925-9635(96)80010-0 |