Deposition of transparent conducting indium tin oxide thin films by reactive ion plating

The deposition of transparent conducting indium tin oxide thin films by reactive ion plating is described. The films were prepared by evaporating indium and tin from a resistance-heated vapour source in an oxygen atmosphere. The glass substrates were heated in situ during the deposition. Electrical...

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Bibliographic Details
Published inThin solid films Vol. 115; no. 3; pp. 195 - 201
Main Authors Yuanri, Cui, Xinghao, Xu, Zhaoting, Jin, Chuancai, Peng, Shuyun, Xie
Format Journal Article
LanguageEnglish
Published Lausanne Elsevier B.V 01.01.1984
Elsevier Science
Subjects
Condensed matter: electronic structure, electrical, magnetic, and optical properties
Exact sciences and technology
Optical properties and condensed-matter spectroscopy and other interactions of matter with particles and radiation
Optical properties of specific thin films
Physics
Crystal growth
Electrical conductivity
Visible absorption
Ion plating
Tin Indium Oxides Mixed
Experimental study
Inorganic compound
Thin film
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Summary:The deposition of transparent conducting indium tin oxide thin films by reactive ion plating is described. The films were prepared by evaporating indium and tin from a resistance-heated vapour source in an oxygen atmosphere. The glass substrates were heated in situ during the deposition. Electrical resistivities of 2 × 10 -4 ω cm were obtained, and the average visible transmittance was 85% with values in excess of 90% being achieved at a wavelength of 0.50 μm.
ISSN:0040-6090
1879-2731
DOI:10.1016/0040-6090(84)90180-9