Recent Developments in Dual-Laser Digital Holography for Plasma-Facing Surface Characterization
A digital holography device is currently undergoing development at the Oak Ridge National Laboratory for the purpose of measuring surface topography, with the goal of deployment as a real-time plasma-facing component diagnostic for the study of materials that could be utilized in a nuclear fusion de...
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Published in | IEEE transactions on plasma science Vol. 48; no. 6; pp. 1655 - 1660 |
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Main Authors | , , , , , |
Format | Journal Article |
Language | English |
Published |
New York
IEEE
01.06.2020
The Institute of Electrical and Electronics Engineers, Inc. (IEEE) |
Subjects | |
Online Access | Get full text |
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Summary: | A digital holography device is currently undergoing development at the Oak Ridge National Laboratory for the purpose of measuring surface topography, with the goal of deployment as a real-time plasma-facing component diagnostic for the study of materials that could be utilized in a nuclear fusion device. The holography system utilizes one or two lasers depending on the scale of surface features under measurement. Measurements of surface roughness were performed in a single-laser mode and compared with the data from profilometry, with a linear correlation of increased holographic measurement fidelity as surfaces became smoother. Characterization of the dual-laser operating mode has been performed via surface measurement of stainless steel targets with "stair-step" features in various sizes. Results demonstrated that surface features with known sizes as small as <inline-formula> <tex-math notation="LaTeX">25.4~\mu \text{m} </tex-math></inline-formula> could be resolved. Measurements were within <inline-formula> <tex-math notation="LaTeX">\sim 55~\mu \text{m} </tex-math></inline-formula> or less deviation from the actual sizes, and measurement accuracy was improved as feature size was increased, corresponding to the effect of noise becoming less pronounced. A target exposed to plasma generated by an electrothermal (ET) arc source was analyzed with flat-field correction and averaging of sequential image frames to demonstrate the improved measurement quality in preparation for future use of holography on ET arc-exposed targets. |
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ISSN: | 0093-3813 1939-9375 |
DOI: | 10.1109/TPS.2019.2943739 |