Recent Developments in Dual-Laser Digital Holography for Plasma-Facing Surface Characterization

A digital holography device is currently undergoing development at the Oak Ridge National Laboratory for the purpose of measuring surface topography, with the goal of deployment as a real-time plasma-facing component diagnostic for the study of materials that could be utilized in a nuclear fusion de...

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Bibliographic Details
Published inIEEE transactions on plasma science Vol. 48; no. 6; pp. 1655 - 1660
Main Authors Smith, Cary D., Biewer, Theodore M., Ren, Xi, Thomas, C. E., Gebhart, Trey, Zhang, Zhili
Format Journal Article
LanguageEnglish
Published New York IEEE 01.06.2020
The Institute of Electrical and Electronics Engineers, Inc. (IEEE)
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Summary:A digital holography device is currently undergoing development at the Oak Ridge National Laboratory for the purpose of measuring surface topography, with the goal of deployment as a real-time plasma-facing component diagnostic for the study of materials that could be utilized in a nuclear fusion device. The holography system utilizes one or two lasers depending on the scale of surface features under measurement. Measurements of surface roughness were performed in a single-laser mode and compared with the data from profilometry, with a linear correlation of increased holographic measurement fidelity as surfaces became smoother. Characterization of the dual-laser operating mode has been performed via surface measurement of stainless steel targets with "stair-step" features in various sizes. Results demonstrated that surface features with known sizes as small as <inline-formula> <tex-math notation="LaTeX">25.4~\mu \text{m} </tex-math></inline-formula> could be resolved. Measurements were within <inline-formula> <tex-math notation="LaTeX">\sim 55~\mu \text{m} </tex-math></inline-formula> or less deviation from the actual sizes, and measurement accuracy was improved as feature size was increased, corresponding to the effect of noise becoming less pronounced. A target exposed to plasma generated by an electrothermal (ET) arc source was analyzed with flat-field correction and averaging of sequential image frames to demonstrate the improved measurement quality in preparation for future use of holography on ET arc-exposed targets.
ISSN:0093-3813
1939-9375
DOI:10.1109/TPS.2019.2943739