Structural characterization of Co in sputtered Ta/Co/Ta thin-film sandwiches

The morphology and structure of sputtered Ta/Co/Ta thin-film sandwiches were investigated by cross-sectional high-resolution transmission electron microscopy. Although the Co layer shows an overall 〈111〉-oriented fcc structure, a high density of hcp stacking faults in present in the layer. The Co st...

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Bibliographic Details
Published inJournal of magnetism and magnetic materials Vol. 148; no. 1; pp. 15 - 16
Main Authors Benaissa, M., Humbert, P., Lefakis, H., Werckmann, J., Speriosu, V.S., Gurney, B.A.
Format Journal Article Conference Proceeding
LanguageEnglish
Published Amsterdam Elsevier B.V 01.07.1995
Elsevier Science
Subjects
Applied sciences
Condensed matter: structure, mechanical and thermal properties
Exact sciences and technology
Metals. Metallurgy
Physics
Structure and morphology; thickness
Surfaces and interfaces; thin films and whiskers (structure and nonelectronic properties)
Thin film structure and morphology
Thin films
Multilayers
Stacking faults
FCC lattices
Tantalum
Morphology
HCP lattices
Microstructure
Cobalt
Sandwich structures
TEM
Crystal structure
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Summary:The morphology and structure of sputtered Ta/Co/Ta thin-film sandwiches were investigated by cross-sectional high-resolution transmission electron microscopy. Although the Co layer shows an overall 〈111〉-oriented fcc structure, a high density of hcp stacking faults in present in the layer. The Co structure can thus be described as a random distribution of hcp stacking sequences in an overall fcc structure.
ISSN:0304-8853
DOI:10.1016/0304-8853(95)00129-8