Direct current diode sputtering: a study of the thermal power dissipated in the substrate

Changes in the thermal power transferred to the substrate from a dc diode sputtering discharge have been investigated. The measurements were made by monitoring the temperature rise during the first seconds of a sputtering run. The results show the contribution of electrons and ions accelerated by th...

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Bibliographic Details
Published inVacuum Vol. 44; no. 2; pp. 117 - 121
Main Authors Mahéo, D, Poitevin, J-M
Format Journal Article
LanguageEnglish
Published Oxford Elsevier Ltd 01.02.1993
Elsevier
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Summary:Changes in the thermal power transferred to the substrate from a dc diode sputtering discharge have been investigated. The measurements were made by monitoring the temperature rise during the first seconds of a sputtering run. The results show the contribution of electrons and ions accelerated by the negative bias voltage. We have also measured the temperature of the substrate, without cooling it may be as high as 600°C.
ISSN:0042-207X
1879-2715
DOI:10.1016/0042-207X(93)90359-I