Electron emission measurements from CVD diamond surfaces

• Published in: Diamond and related materials Vol. 5; no. 6; pp. 802 - 806
• Main Authors: Bozeman, S.P., Baumann, P.K., Ward, B.L., Powers, M.J., Cuomo, J.J., Nemanich, R.J., Dreifus, D.L.
• Format: Journal Article Conference Proceeding
• Language: English
• Published: Amsterdam Elsevier B.V 01.05.1996; Elsevier
• Subjects: Adsorbed layers and thin films; Condensed matter: electronic structure, electrical, magnetic, and optical properties; CVD diamond; Electron and ion emission by liquids and solids; impact phenomena; Exact sciences and technology; Field emission; Field emission, ionization, evaporation, and desorption; Photoemission and photoelectron spectra; Physics; Secondary electron yield; UV photoelectron spectroscopy; UV photoelectron spectroscopy; Field emission; CVD diamond; Secondary electron yield; Fowler-Nordheim theory; Epitaxial layers; Hydrogen; Physical radiation effects; Diamonds; Surface treatments; Secondary emission; Experimental study; Photoelectron spectroscopy; Ultraviolet radiation; Electron beams; Electron emission
• ISSN: 0925-9635; 1879-0062
• DOI: 10.1016/0925-9635(95)00417-3

Electron emission measurements on diamond films synthesized by chemical vapor deposition are reported. UV photoemission spectroscopy indicates that the samples exhibit a negative electron affinity after exposure to hydrogen plasma. Secondary electron emission yields vary from 2.2 to 9.2. Field emission current-voltage measurements indicate threshold voltages ranging from 28 to 84 V μm −1. The film with the highest secondary yield also exhibits the lowest emission threshold.